Plasma processing

From Wikipedia, the free encyclopedia

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]

Plasma processing techniques include:


Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.


References[edit]

  1. ^ National Research Council (1991). Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: National Academies Press. doi:10.17226/1875. ISBN 978-0-309-04597-1.